Process and amine-solvent absorbent for removing acidic gases fr

Details Process and amine-solvent absorbent for removing acidic gases fr Process and amine-solvent absorbent for removing acidic gases fr

1977-09-22

1980-12-23

Padgett, Benjamin R.

Compositions

Co, s, negative element, or acid, bindant containing

423220, 423226, 423228, 252190, C09K 300

Patent

active

042409225

ABSTRACT:
Acidic gases are substantially removed from a normally gaseous mixture by a process comprising contacting the normally gaseous mixture with an amine-solvent liquid absorbent comprising (i) an amine mixture comprised of at least about 50 mol % of a sterically hindered amine and at least about 10 mol % of a tertiary amino alcohol, wherein said sterically hindered amine contains at least one secondary amino group which is part of a ring and is attached to either a secondary or tertiary carbon atom or a primary amino group attached to a tertiary carbon atom, and (ii) a solvent for said amine mixture which is also a physical absorbent for said acidic gases. The liquid absorbent may also include up to about 35 weight percent water. The coaction of the sterically hindered amine and the tertiary amino alcohol in conjunction with the solvent provides an increase in the amount of CO.sub.2 containing acidic gases absorbed compared to the use of the same sterically hindered amines alone and lowers the heat of reaction.

REFERENCES:
patent: 2139122 (1978-06-01), Hass et al.
patent: 2139124 (1938-12-01), Hass et al.
patent: 3848057 (1974-11-01), Leder et al.

Affiliated with

Also associated with

Rating

Process and amine-solvent absorbent for removing acidic gases fr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and amine-solvent absorbent for removing acidic gases fr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and amine-solvent absorbent for removing acidic gases fr will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2241398