Procedure and apparatus for the determination of concentration o

Details Procedure and apparatus for the determination of concentration o Procedure and apparatus for the determination of concentration o

1994-02-07

1996-03-12

Tung, T.

Electrolysis: processes, compositions used therein, and methods

Electrolytic analysis or testing

For nitrogen or nitrogen containing compound

204412, 204418, 204431, 205792, G01N 2726

Patent

active

054983231

ABSTRACT:
A procedure and an apparatus to determine the concentration of dissolved ammonia. A polypyrrole electrode (2), a reference electrode (1) and an auxiliary electrode (5) are placed in the liquid to be analyzed and the concentration of ammonia dissolved in the liquid is determined by a potential applied between the polypyrrole electrode (2) and the reference electrode (1) and of the current flowing between the polypyrrole electrode (2) and the auxiliary electrode (5). A polypyrrole layer (4) is formed on a platinum substrate (3).

REFERENCES:
patent: 4235689 (1980-11-01), Petersen et al.
patent: 4681115 (1987-07-01), Holscher
patent: 4968400 (1990-11-01), Shimomura et al.
patent: 5089294 (1992-02-01), Ratcliffe
patent: 5198092 (1993-03-01), Kiesele et al.
Dall'Olio et al., Akad. Sci., Ser. C. 267 (1968)*8, pp. 433-435.
Miasik et al, Conducting Polymers, Alcacer (ed.), D. Reidel Publishing Company (1987)*, pp. 189-197.
Kanazawa et al, J. C. S. Chem. Comm (1979)*, pp. 854-855.
Bull et al, J. Electrochem. Soc., 129 (1982), pp. 1009-1015.
Diaz et al, J. C. S. Chem. Comm. (1979), pp. 635-636.

Affiliated with

Also associated with

Rating

Procedure and apparatus for the determination of concentration o does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Procedure and apparatus for the determination of concentration o, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Procedure and apparatus for the determination of concentration o will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2098106