Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Reexamination Certificate
2011-02-15
2011-02-15
Moore, Karla (Department: 1716)
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
C118S7230VE
Reexamination Certificate
active
07887635
ABSTRACT:
The present invention provides a printing head for nano patterning including a manifold for accommodating a liquid printing material, a cartridge with an injection chamber communicating with the manifold, and a sample holder for patterning installed outside the injection chamber of the cartridge. The printing head comprises a shadow mask which is installed outside the injection chamber to be finely moved in an X-Y direction and has a single injection hole with a relatively very small size; an actuator for finely moving the shadow mask; an injection-inducing unit including a high voltage generator, a power supply electrode that is installed within the injection chamber and receives power from the high voltage generator to generate positive charges, and an opposite electrode for generating negative charges on the sample holder in a state where the shadow mask is interposed between the power supply electrode and the opposite electrode, thereby generating induced discharge from the injection chamber toward the sample holder; and a control unit for controlling the driving of the actuator so that the injection hole of the shadow mask can be moved to patterning positions corresponding to patterning data input in advance. According to the present invention, patterning accuracy can be improved, ultra-fine patterning and patterning of arbitrary shapes can be achieved, and a configuration for injecting the printing material can be simplified.
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Choi Byung-Oh
Choi Doo-Sun
Kim Dong-Soo
Lee Taek-Min
Lee Won-Hee
Holme Roberts & Owen LLP
Korea Institute of Machinery & Materials
Moore Karla
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