Etching a substrate: processes – Forming or treating thermal ink jet article
Patent
1995-01-03
1997-04-15
Breneman, R. Bruce
Etching a substrate: processes
Forming or treating thermal ink jet article
347 42, 438 21, 438456, 438458, 216 2, H01L 2100, G01D 1518, B44C 122
Patent
active
056206143
ABSTRACT:
A method of fabricating a pagewidth array of buttable printheads reduces end channel damage. The wafer containing a plurality of arrays of channels is provided with V-grooves. A V-groove is positioned between each array. When the wafer is secured to a wafer containing heater plates, wafers are diced along the V-shaped grooves to reduce damage to the end channels of the array to improve print quality.
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Drake Donald J.
Fisher Almon P.
Adjodha Michael E
Breneman R. Bruce
Xerox Corporation
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