Printable medium for the etching of silicon dioxide and...

Details Printable medium for the etching of silicon dioxide and... Printable medium for the etching of silicon dioxide and...

2005-12-19

2010-11-23

Culbert, Roberts (Department: 1716)

Etching a substrate: processes

Nongaseous phase etching of substrate

Using film of etchant between a stationary surface and a...

C216S083000, C216S099000, C252S079100

Reexamination Certificate

active

07837890

ABSTRACT:
The present invention relates to a novel printable etching medium having non-Newtonian flow behavior for the etching of surfaces in the production of solar cells and to the use thereof. In particular, the invention relates to corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas.

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patent: WO 01/83391 (2001-11-01), None
patent: WO 03/034504 (2003-04-01), None

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