Primary cleaning of photoreceptor substrates by immersion in dry

Details Primary cleaning of photoreceptor substrates by immersion in dry Primary cleaning of photoreceptor substrates by immersion in dry

1992-03-27

1993-08-03

Morris, Theodore

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

134 8, 134 32, 134 33, 51 7, 51322, B08B 704, B24B 100, B24C 700

Patent

active

052325121

ABSTRACT:
A method and apparatus for cleaning photoreceptor substrates where at least one substrate is rotated in a bath of moving dry ice particles. The dry ice particles contact the outer surface of the substrate, melt locally upon contact and refreeze to capture particulate contaminants on the outer surface of the dry ice particles. An inert gas counter current to the flow of moving dry ice particles is supplied to enhance cleaning efficiency and assist in removing carbon dioxide, contaminants and small dry ice particles.

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patent: 5038707 (1991-08-01), Swain et al.
patent: 5123206 (1992-06-01), Woodson

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