Compositions – Gaseous compositions – Carbon-oxide and hydrogen containing
Patent
1989-04-03
1990-03-20
Mars, Howard T.
Compositions
Gaseous compositions
Carbon-oxide and hydrogen containing
48197R, C01B 322, C01B 324
Patent
active
049099582
ABSTRACT:
A sulfur-containing heavy liquid hydrocarbonaceous fuel and/or solid carbonaceous fuel with a nickel, vanadium, and silicon containing ash is mixed with a silicon-containing material, and a copper and/or cobalt-containing material. The mixture is reacted by partial oxidation in a down-flowing free-flow unobstructed vertical reaction zone with refractory lined walls at a temperature in the range of about 1800.degree. F. to 2900.degree. F. A raw effluent gas stream is produced comprising H.sub.2 +CO and containing entrained slag comprising the following phases: (i) an alloy phase selected from the group consisting fo Cu-Ni, Co-Ni, Cu-Fe, and mixtures thereof; (ii) a silicate phase selected from the group consisting of copper silicate, cobalt silicate, and mixtures thereof; (iii) a spinel phase; and (iv) a fluid oxysulfide phase comprising at least one sulfide from the group consisting of Cu, Co, Fe, and mixtures thereof. There is a reduction in the mole ratio H.sub.2 S+COS/H.sub.2 +CO in the raw effluent gas steam. Non-gaseous materials e.g. slag containing substantially no Ni.sub.3 S.sub.2 are separated from the hot raw effluent gas stream from the gasifier.
REFERENCES:
patent: 4851152 (1989-07-01), Najjar
Brent Albert
Kulason Robert A.
Mars Howard T.
O'Loughlin James J.
Texaco Inc.
LandOfFree
Prevention of formation of nickel subsulfide in partial oxidatio does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Prevention of formation of nickel subsulfide in partial oxidatio, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Prevention of formation of nickel subsulfide in partial oxidatio will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-791131