Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1999-05-28
2000-03-28
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427 5, 4272492, 4272497, 4272554, 427295, 427318, 427327, 427350, 427399, 427402, 427528, 427529, 427533, 427558, 427595, C23C 1400
Patent
active
060428961
ABSTRACT:
A method for preventing radioactive contamination of porous surfaces comprising providing an apparatus for handling radioactive material comprising a porous surface; exposing the porous surface to a vacuum; depositing a flowable precursor material onto the porous surface, wherein the porous surface comprises pores and the vacuum is effective to substantially fill the pores with the flowable precursor material; subjecting the flowable precursor material to energy sufficient to convert the flowable precursor material to an effective sealant film comprising amorphous carbon. In a preferred embodiment, the porous surface is an anodized aluminum surface.
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Dearnaley Geoffrey
Rodriguez Louis
Pianalto Bernard
Southwest Research Institute
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