Pretreatment of substrates prior to thin film deposition

Details Pretreatment of substrates prior to thin film deposition Pretreatment of substrates prior to thin film deposition

1979-03-19

1981-05-26

Newsome, John H.

Coating apparatus

With vacuum or fluid pressure chamber

With means to apply electrical and/or radiant energy to work...

118723, 427 39, C23C 1300, C23C 1700

Patent

active

042691370

ABSTRACT:
To facilitate the ion bombardment of a substrate surface as a pretreatment step prior to depositing thin films in a high vacuum evaporation system, a thermionic electron source is placed in the cathode electrode used to generate the plasma that provides the ion bombardment. The thermionic electron source does not interfere with the basic function of the plasma system. Its main effect is to enhance the plasma efficiency by injecting electrons into the surrounding space, reducing charging effects on surfaces, neutralizing the plasma cloud, causing less plasma dispersion, and perhaps, most importantly, allowing the plasma to be sustained at lower pressures and higher voltages resulting in greater ion energies and mobility for improved surface bombardment.
Other electron sources, such as, a cathode ray accelerator as a beta emitter, may be positioned to simultaneously or independently, to inject electrons into the plasma and to direct electrons toward the substrate surface to neutralize surface charge.

REFERENCES:
patent: 2373639 (1945-04-01), Turner
patent: 2752882 (1956-07-01), Heimann
patent: 3069286 (1962-12-01), Hall
patent: 3326177 (1967-06-01), Taylor
patent: 3402073 (1968-09-01), Pierce
patent: 3889632 (1975-06-01), Brunner et al.
patent: 3913520 (1975-10-01), Berg et al.
patent: 3921572 (1975-11-01), Brunner et al.
Maissel et al., Handbook of Thin Film Technology, McGraw-Hill Book Co., New York (1970), pp. 6-41 and 6-42.
Williams et al., "Materials Research Bull.", vol. 14, pp. 59-65, Jan. 1979.

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