Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1979-06-11
1981-03-03
Rutledge, L. Dewayne
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
148 15, 156643, 427 35, 427 431, H01L 2126, B05D 306
Patent
active
042538882
ABSTRACT:
Method for the production of an LSI circuit device, in which method an organic compound film such as photoresist films is suitably treated to become a heat resistant film and it is used in various production processes as a mask pattern at a temperature of more than 200.degree. C. without deforming the original size of the mask pattern.
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Matsushita Electric - Industrial Co., Ltd.
Roy Upendra
Rutledge L. Dewayne
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