Cleaning and liquid contact with solids – Apparatus – With non-impelling fluid deflector or baffle other than...
Reexamination Certificate
2005-03-01
2005-03-01
Stinson, Frankie L. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
With non-impelling fluid deflector or baffle other than...
C134S198000, C134S902000, C134S186000, C239S568000, C239S590500
Reexamination Certificate
active
06860279
ABSTRACT:
The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by “diffusing” pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.
REFERENCES:
patent: 18909 (1857-12-01), Sweetland
patent: 1631585 (1927-09-01), D'olier et al.
patent: 1789717 (1931-01-01), Walker
patent: 1966471 (1934-07-01), Walters
patent: 2489485 (1949-11-01), Franklin
patent: 2684941 (1954-07-01), Pasveer
patent: 2893846 (1959-07-01), Wistrich et al.
patent: 2965314 (1960-12-01), Salomon
patent: 2985387 (1961-05-01), Sprang, Jr.
patent: 2993565 (1961-07-01), Coulter
patent: 3045989 (1962-07-01), Kittel
patent: D201653 (1965-07-01), Person
patent: 3245113 (1966-04-01), Sulich
patent: 3353752 (1967-11-01), Ranhagen et al.
patent: 3412740 (1968-11-01), Binks
patent: 3429335 (1969-02-01), Schoen et al.
patent: 3468712 (1969-09-01), Gillespie
patent: 3557827 (1971-01-01), Marsh
patent: 3568935 (1971-03-01), Hoffman
patent: 3733056 (1973-05-01), Fong
patent: 3934521 (1976-01-01), Andreoli
patent: 4345894 (1982-08-01), Smith et al.
patent: 4492562 (1985-01-01), Michel
patent: 4557877 (1985-12-01), Hofstter
patent: 4635666 (1987-01-01), Daley et al.
patent: 4679720 (1987-07-01), Sedrick et al.
patent: 4722355 (1988-02-01), Moe et al.
patent: 4829158 (1989-05-01), Burnham
patent: 4846202 (1989-07-01), Kallweit
patent: 4875824 (1989-10-01), Moe et al.
patent: 5039349 (1991-08-01), Schoeppel
patent: 5054519 (1991-10-01), Berman
patent: 5082518 (1992-01-01), Molinaro
patent: 5160544 (1992-11-01), Garg et al.
patent: 5180467 (1993-01-01), Cook et al.
patent: 5236515 (1993-08-01), Ueno et al.
patent: 5241839 (1993-09-01), Hughes
patent: 5327921 (1994-07-01), Mokuo et al.
patent: 5365960 (1994-11-01), Bran
patent: D357732 (1995-04-01), Spechts et al.
patent: 5474616 (1995-12-01), Hayami et al.
patent: 5482068 (1996-01-01), Kitahara et al.
patent: 5503171 (1996-04-01), Yokomizo et al.
patent: 5533444 (1996-07-01), Parks
patent: D376006 (1996-11-01), Smolarski
patent: 5595602 (1997-01-01), Harlan
patent: 5614264 (1997-03-01), Himes
patent: 5649821 (1997-07-01), Fogliani et al.
patent: 5656097 (1997-08-01), Olesen et al.
patent: 5776296 (1998-07-01), Matthews
patent: 5779816 (1998-07-01), Trinh
patent: 5788304 (1998-08-01), Korn et al.
patent: 5845660 (1998-12-01), Shindo et al.
patent: 5846374 (1998-12-01), Parab et al.
patent: 5865894 (1999-02-01), Reynolds
patent: 5875804 (1999-03-01), Tanaka et al.
patent: 5909846 (1999-06-01), Sasaki
patent: 5919520 (1999-07-01), Tateyama et al.
patent: 5992431 (1999-11-01), Weber et al.
patent: 6119367 (2000-09-01), Kamikawa et al.
patent: 6132656 (2000-10-01), Dodd
patent: 6142391 (2000-11-01), Seyed-Yagoobi et al.
patent: 6202318 (2001-03-01), Guldi et al.
patent: 6561795 (2003-05-01), Lasagni et al.
patent: 6630030 (2003-10-01), Suntola et al.
patent: 2565425 (1985-12-01), None
patent: 58-66333 (1983-04-01), None
patent: 1-265520 (1989-10-01), None
patent: 3-64916 (1991-03-01), None
patent: 4-56321 (1992-02-01), None
patent: 4-99025 (1992-03-01), None
patent: 4-99025 (1992-03-01), None
patent: 4-207031 (1992-07-01), None
patent: 5-20266 (1993-08-01), None
patent: 6-349721 (1994-12-01), None
patent: 2000-223874 (2000-08-01), None
Harris Semiconductor, “Lexicon—B.” (http://rel.semi.harris.com/docs/lexicon/B.htm), 4 pages, Mar. 2, 1999.
Harris Semiconductor, “Lexicon—C.” (http://rel.semi.harris.com/docs/lexicon/B.htm), 8 pages, Apr. 17, 1999.
Harris Semiconductor, “Lexicon—E.” (http://rel.semi.harris.com/docs/lexicon/E.htm), 3 pages, Apr. 17, 1999.
Harris Semiconductor, “Lexicon—I.” (http://rel.semi.harris.com/docs/lexicon/I.htm), 3 pages, Apr. 17, 1999.
Harris Semiconductor, “Lexicon—P.” (http://rel.semi.harris.com/docs/lexicon/P.htm), 5 pages, Feb. 25, 1999.
Harris Semiconductor, “Lexicon—S.” (http://rel.semi.harris.com/docs/lexicon/S.htm), 10 pages, Apr. 17, 1999.
Harris Semiconductor, “Lexicon—W.” (http://rel.semi.harris.com/docs/lexicon/W.htm), 1 pages, Mar. 2, 1999.
Knobbe Martens Olson & Bear LLP
Micro)n Technology, Inc.
Stinson Frankie L.
LandOfFree
Pressurized liquid diffuser does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pressurized liquid diffuser, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pressurized liquid diffuser will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3443780