Pressurization and control devices using high vapor pressure liq

Power plants – Reaction motor – Liquid oxidizer

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

60 3948, F02K 950

Patent

active

056408447

ABSTRACT:
There is provided a system for expelling a liquid fuel component from a tank to a rocket engine utilizing a pressurized gas to displace the propellant. A pressurized high vapor pressure liquid is combined with the pressurized gas reducing the volume of pressurizing agent required to expel a desired volume of the liquid fuel component. Since the volume of pressurizing gas is less, the weight of the propelled craft may be reduced or additional fuel carried. In another embodiment of the invention, the vapor phase of the high vapor pressure liquid is used as a reference pressure to control other systems.

REFERENCES:
patent: 2732657 (1956-01-01), Krautkramer
patent: 3009316 (1961-11-01), McKinley
patent: 3049832 (1962-08-01), Joffe
patent: 3098353 (1963-07-01), Abild
patent: 3132977 (1964-05-01), Knight
patent: 3140582 (1964-07-01), Tyson, Jr.
patent: 3257799 (1966-06-01), Goalwin
patent: 3336750 (1967-08-01), Beckmann
patent: 3427806 (1969-02-01), Truax et al.
patent: 3427808 (1969-02-01), Butcher
patent: 3517508 (1970-06-01), Newman et al.
patent: 3545068 (1970-12-01), Bowles
patent: 3672165 (1972-06-01), Baum
patent: 3945203 (1976-03-01), Kayser
patent: 4132165 (1979-01-01), Leeson
patent: 4279269 (1981-07-01), Schink et al.
patent: 4305247 (1981-12-01), Ellion et al.
patent: 4470258 (1984-09-01), Steenborg
patent: 4656828 (1987-04-01), Bingley et al.
patent: 4867195 (1989-09-01), Blewett et al.
patent: 4901525 (1990-02-01), Beveridge et al.
patent: 4926632 (1990-05-01), Smith et al.
patent: 4946522 (1990-08-01), Liedtke et al.
patent: 5027596 (1991-07-01), Steenborg
patent: 5481869 (1996-01-01), Pahl
Rocket Propulsion by Marcel Barrere et al, National Office for Aeronautical Studies and Researches (ONERA), Paris. (1960) Utilization Quality p. 9.4.7 641.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Pressurization and control devices using high vapor pressure liq does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pressurization and control devices using high vapor pressure liq, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pressurization and control devices using high vapor pressure liq will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-144332

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.