Receptacles – High-pressure-gas tank
Reexamination Certificate
2006-05-02
2006-05-02
Castellano, Stephen (Department: 3727)
Receptacles
High-pressure-gas tank
Reexamination Certificate
active
07036677
ABSTRACT:
The present invention relates to a pressure vessel for storage of solid, liquid and/or gaseous media under an operating pressure above atmospheric pressure, wherein the pressure vessel encloses a hollow space provided for storage of the medium, and is provided with at least one connector for loading and/or unloading. Because the pressure vessel is composed at least in part of a tube that in turn is manufactured from a fiber-reinforced thermoplastic, wherein the thermoplastic material contains more than 10% by volume of fibers with an average fiber length over 50 mm, the pressure vessel has a low weight and a very good resistance to corrosion and resistance to chemically aggressive media, yet it nevertheless withstands the mechanical stresses of the normal high operating pressures up to 25 Mpa.
REFERENCES:
patent: 3608767 (1971-09-01), Elliot et al.
patent: 4044184 (1977-08-01), Ashida et al.
patent: 4333671 (1982-06-01), Holko
patent: 5197628 (1993-03-01), Phan et al.
patent: 5564587 (1996-10-01), Falk et al.
patent: 5644919 (1997-07-01), Baker et al.
patent: 79750 (1971-02-01), None
patent: 3922577 (1991-01-01), None
patent: 69101588 (1991-12-01), None
patent: 023605 (1987-08-01), None
patent: 0333013 (1989-09-01), None
patent: 0635672 (1995-01-01), None
patent: 0810081 (1997-12-01), None
patent: WO9210702 (1992-06-01), None
patent: WO9220954 (1992-11-01), None
Funck Ralph
Hausmann Joachim
Castellano Stephen
Funck Ralph
Paul & Paul
LandOfFree
Pressurised tank and method for making same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pressurised tank and method for making same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pressurised tank and method for making same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3568827