Pressure sensitive adhesive film for protection of...

Stock material or miscellaneous articles – Web or sheet containing structurally defined element or... – Adhesive outermost layer

Reexamination Certificate

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C438S459000, C257S642000

Reexamination Certificate

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10506806

ABSTRACT:
The present invention relates to a surface protecting adhesive film for a semiconductor wafer in which an adhesive layer having a storage elastic modulus from 1×105Pa to 1×107Pa at 150° C. and a thickness of from 3 μm to 100 μm is formed on both a surface and back surface of a base film having a melting point of at least 200° C. and a thickness of 10 μm to 200 μm. According to the present invention, in a step of grinding the back side of a semiconductor wafer and removing a damaged layer generated on the back side, the semiconductor wafer can be prevented from being broken and being contaminated and the like even if a semiconductor wafer is thinned as low as 100 μm.

REFERENCES:
patent: 5753362 (1998-05-01), Kawase et al.
patent: 6114753 (2000-09-01), Nagai et al.
patent: 6398892 (2002-06-01), Noguchi et al.
patent: 6699774 (2004-03-01), Takyu et al.
patent: 6730595 (2004-05-01), Saimoto et al.
patent: 6777310 (2004-08-01), Inuzuka
patent: 2001/0014492 (2001-08-01), Noguchi et al.
patent: 0 959 498 (1999-11-01), None
patent: 0 981 156 (2000-02-01), None
patent: 1 002 845 (2000-05-01), None
patent: 10-242086 (1998-09-01), None
patent: 2001-077304 (2001-03-01), None
patent: 2002-53819 (2002-02-01), None
English translation of JP 2002-053819 published Feb. 19, 2002.
English translation of JP 10-242086 published Sep. 11, 1998.

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