Fluid handling – Processes – Cleaning – repairing – or assembling
Reexamination Certificate
2004-07-02
2011-11-08
Lee, Kevin (Department: 3753)
Fluid handling
Processes
Cleaning, repairing, or assembling
C137S240000
Reexamination Certificate
active
08051870
ABSTRACT:
The object of the present invention is to provide a low pressure processing system having no possibility of leakage at a valve provided in an exhaust passage when the valve is closed, and capable of reducing a load of maintenance work. An exhaust pipe3connected to a reaction tube1is provided therein with a gate valve4for hermetically closing the exhaust passage. A purge gas is jetted, from jetting ports circumferentially arranged respectively in a valve seat and a valving element of the gate valve, into a gap between the valve seat and the valving element. This prevents foreign objects originated from a process gas from adhering to those surfaces of the valve seat and the valving element that face the gap between the valve seat and valving element, improving sealing capability of the gate valve.
REFERENCES:
patent: 2254472 (1941-09-01), Dahl
patent: 3133554 (1964-05-01), Joebken
patent: 4174728 (1979-11-01), Usnick et al.
patent: 4383546 (1983-05-01), Walters, Jr.
patent: 4554942 (1985-11-01), Williams et al.
patent: 5678595 (1997-10-01), Iwabuchi
patent: 5755255 (1998-05-01), Iwabuchi
patent: 5950646 (1999-09-01), Horie et al.
patent: 6123909 (2000-09-01), Yamamoto et al.
patent: 56-105183 (1981-08-01), None
patent: 08-285132 (1996-11-01), None
patent: 08-285133 (1996-11-01), None
patent: 09-089139 (1997-03-01), None
patent: 11-195649 (1999-07-01), None
patent: 11-214317 (1999-08-01), None
patent: 11-325313 (1999-11-01), None
patent: 453974 (2001-09-01), None
Notification of Transmittal of Translation of the International Preliminary Report on Patentability (Form PCT/IB/338)—PCT/JP2004/009440, dated Jan. 2004.
PCT International Preliminary Report on Patentability (Form PCT/IB/373)—PCT/JP2004/009440, dated Jan. 2004.
Translation of PCT Written Opinion of the International Searching Authority—(Form PCT/ISA/237)—PCT/JP2004/009440, dated Jan. 2004.
Korean Office Action issued on Sep. 27, 2010 for KR Application No. 10-2005-7008327 w/English translation.
Lee Kevin
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
LandOfFree
Pressure reduction process device, pressure reduction... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pressure reduction process device, pressure reduction..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pressure reduction process device, pressure reduction... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4254761