Pressure pulse cleaning

Details Pressure pulse cleaning Pressure pulse cleaning

1992-12-09

1996-05-07

Straub, Gary P.

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

B08B 9093

Patent

active

055142206

ABSTRACT:
The present invention is a method which relies on pressure pulse cleaning. By "pressure pulse cleaning" it is meant that the pressure and temperature of a fluid, such as carbon dioxide is raised to near or above supercritical conditions, which is then contacted with the item(s) to be cleaned. Periodically, the pressure of the supercritical fluid is pulsed or spiked to higher levels and returned to substantially the original level. Potential candidates for treatment by the present invention include but are not limited to precision parts such as gyroscopes used in missile guidance systems, accelerometers, thermal switches, nuclear valve seals, electromechanical assemblies, polymeric containers, special camera lenses, laser optics components, and porous ceramics.

REFERENCES:
patent: 5013366 (1991-05-01), Jackson et al.
patent: 5267455 (1993-12-01), Dewees et al.
NASA Technical Brief MFS-29611; Motyl; "Cleaning Metal Substrates Using Liquid/Supercritical Fluid Carbon Dioxide" (odd pages) (Mar. 1979).

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