Pressure monitoring and method

Details Pressure monitoring and method Pressure monitoring and method

1990-08-14

1991-11-12

Woodiel, Donald O.

Measuring and testing

Fluid pressure gauge

Combined

G01L 700

Patent

active

050637835

ABSTRACT:
System and method for monitoring gas pressure in semiconductor processing equipment and the like. A small backflow of an inert gas is passed through the monitoring system to isolate the system from corrosive gases in a chamber to which the system is connected. The backflow passes through a flow restrictor of known resistance between a pressure sensor and the chamber, and the drop in pressure across the restrictor is determined and combined with the pressure measured by the sensor to determine the pressure in the chamber.

REFERENCES:
patent: 1100867 (1914-06-01), Dexter
patent: 3246522 (1966-04-01), Rapson
patent: 3659459 (1972-05-01), Moreau
patent: 3721126 (1973-03-01), Beals et al.

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