Pressure fog-resistant photographic element

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Silver compound sensitizer containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430569, G03C 1035

Patent

active

052983846

ABSTRACT:
A method for controlling pressure-induced fog in a silver bromide photographic material involves surface treatment of the emulsion AgBr grains with thiocyanate and an iodide salt. In particular, a process for making a pressure fog-resistant photographic emulsion includes steps of forming a photographic emulsion containing cubic or cubooctahedral silver bromide grains, surface-treating the AgBr grains with a thiocyanate by adding the thiocyanate to the emulsion, chemically sensitizing the emulsion, maintaining the emulsion at a temperature and for a time sufficient to allow the thiocyanate to react with the grain surfaces, and then surface-treating the AgBr grains with an iodide salt by adding the salt to the emulsion in an amount and under conditions effective to fill in cubic faces of the AgBr grains. The latter step partially or fully converts the AgBr grains to octahedral grains. A photographic element can then be made by coating the emulsion on a suitable base.

REFERENCES:
patent: 3320069 (1967-05-01), Illingsworth
patent: 4177071 (1979-12-01), DeBrabandere et al.
patent: 4247620 (1981-01-01), Nagatani et al.
patent: 4495277 (1985-01-01), Becker et al.
patent: 4921784 (1990-05-01), Ikeda et al.
patent: 5017468 (1991-05-01), Joly et al.
patent: 5168035 (1992-12-01), Lushington et al.
World Patents Index Latest, Section PQ, Week 4084, Derwent Publications Ltd., London Publications, Ltd., London GB; Class P83, AN84-247118 & JPA59149349 (Konishiroku Photo K.K.) 27, Abstract.
Abstract of Japanese Patent 62-18538, Jan. 27, 1987.
Abstract of Japanese Patent 59-50438, Mar. 23, 1984.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Pressure fog-resistant photographic element does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pressure fog-resistant photographic element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pressure fog-resistant photographic element will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-790790

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.