Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer
Patent
1994-12-19
1997-05-27
Epps, Georgia Y.
Optics: measuring and testing
By dispersed light spectroscopy
Utilizing a spectrometer
356345, G01B 902
Patent
active
056337140
ABSTRACT:
An optical method measures a pattern on a substrate with the output of an optical imaging system, amplitude and phase imaging for narrow angle, single wavelength, polarized illumination in a coherence probe type of interferometric microscope system, the microscope system including a microprocessor providing signals derived from the amplitude and phase imaging. Derive raw interferometer fringe amplitude and phase data from the microprocessor. Converting the fringe amplitude and phase data into amplitude and phase data. Derive a fourier transform of the amplitude and phase data. Apply corrections to the transformed data. Select image type and then means for deriving the inverse transform from the corrected data and processing to provide amplitude and phase image data as a first image output, and/or bright field image processing to provide a second image output, and/or dark field image processing to provide a third image output, and/or processing of the corrected phase image P"(.mu.,z.sub.n) to provide a fourth image output, and process corrected amplitude a"(.mu.,z.sub.n) to provide a fifth image output, and means for measuring critical dimension or overlay from one of the image outputs.
REFERENCES:
D. Nyyssonen, J. Seligson and I. Mazor, "Phase Image Metrology with a Modified Coherence Probe Microscope," Proc. SPIE vol. 1926-23, pp. 299-310 (1993).
V. Tychinsky and A. Tavrov describe in "Optical 3D Monitoring VLSI Structures" Proc. SPIE vol. 1673, pp. 483-485 (1992).
E. C. Kintner, "Method for the Calculation of Partially Coherent Imagery," App. Opt. 17, pp. 2747-2753 (1978).
D. Nyyssonen and C. Kirk, "Optical Microscope Imaging of Lines Patterned in Thick Layers with Variable Edge Geometry: Theory," J. Opt. Soc. Am. A 5, pp. 1270-1280 (1988).
M. Davidson, K. Kaufman and I. Mazor, "First Results of a Product Utilizing Coherence Probe Imaging for Wafer Inspection," Proc. SPIE vol. 921, (1988) pp. 1270-1280.
D. Nyyssonen, "Narrow-Angle Laser Scanning Microscope Systems for Linewidth Measurements on Wafers," NISTIR 88-3808, pp. 1-107 (Jun. 1988).
Epps Georgia Y.
International Business Machines - Corporation
Jones II Graham S.
Kim Robert
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