Preparing porous diaphragms for electrolytic cells having non-un

Plastic and nonmetallic article shaping or treating: processes – Reactive gas or vapor treatment of work – Work is organic material

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204252, 204253, 204295, 204296, 264104, 264344, 429252, B29C 2500, B29D 2700

Patent

active

044683600

ABSTRACT:
A porous diaphragm for an electrolytic cell for the electrolysis of alkali metal halides is comprised of a thermoplastic support fabric impregnated with particles of a siliceous composition. The thermoplastic support fabric has an anode side, a cathode side opposite the anode side, and a thickness of at least 0.3 millimeters. The cathode side has a greater hydrophobicity than the anode side. To provide greater hydrophobicity which results in controlled, reduced cell voltages, for example, the cathode side of the support fabric is treated with an oxidizing agent.

REFERENCES:
patent: 4056447 (1977-11-01), Giuffre et al.
patent: 4089759 (1978-05-01), Krumpelt et al.
patent: 4168221 (1979-09-01), Kadija et al.
patent: 4184939 (1980-01-01), Kadija
patent: 4207163 (1980-06-01), Kadija
patent: 4207164 (1980-06-01), Kadija
patent: 4216072 (1980-08-01), Kadija
patent: 4258081 (1981-03-01), Kadija
patent: 4278524 (1981-07-01), Kadija
"Catalyst Carriers to Chloralkali", Encyclopedia of Chemical Processing and Design, vol. 7, p. 346, (1978).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Preparing porous diaphragms for electrolytic cells having non-un does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Preparing porous diaphragms for electrolytic cells having non-un, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preparing porous diaphragms for electrolytic cells having non-un will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-876889

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.