Preparation of sulfur-containing organosilicon compounds

Details Preparation of sulfur-containing organosilicon compounds Preparation of sulfur-containing organosilicon compounds

1996-10-31

1997-09-02

Shaver, Paul F.

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

C07F 708

Patent

active

056633963

ABSTRACT:
The present invention relates to a process for the production of organosilicon compounds of the formula

REFERENCES:
patent: 3842111 (1974-10-01), Meyer-Simon et al.
patent: 3873489 (1975-03-01), Thurn et al.
patent: 3978103 (1976-08-01), Meyer-Simon et al.
patent: 3997581 (1976-12-01), Pietka et al.
patent: 4129585 (1978-12-01), Buder et al.
patent: 4384132 (1983-05-01), Schwarz et al.
patent: 4401598 (1983-08-01), Karl et al.
patent: 4408064 (1983-10-01), Schwarz et al.
patent: 4433164 (1984-02-01), Jenck
patent: 4507490 (1985-03-01), Panster et al.
patent: 4595740 (1986-06-01), Panster
patent: 4946977 (1990-08-01), Bernhardt et al.
patent: 5110969 (1992-05-01), Dittrich et al.
patent: 5405985 (1995-04-01), Parker et al.
patent: 5468893 (1995-11-01), Parker et al.
patent: 5489701 (1996-02-01), Childress et al.
patent: 5583245 (1996-12-01), Parker et al.
patent: 5596116 (1997-01-01), Childress et al.
Deng Peng and Chen Jia-Yong's "Disproportionation Reaction of Elemental Sulfur by Phase Transition Catalysis," Journal of Inorganic Chemistry, 3(4):128-130 (1987).
S. Wolff, et al., Eur. Rubber J., 16, Jan. 1994.
K. E. Koenig, et al., Tet. Lett., 2275 (1974).
Results from a computerized technical search.

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