Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth
Patent
1994-12-07
1995-12-26
Breneman, R. Bruce
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having pulling during growth
117 20, C30B 1520
Patent
active
054778050
ABSTRACT:
A Si material mixed with Group-V element is melted in a crucible, and then held in a chamber filled with a rare gas at atmospheric pressure of 100 torr. or higher. A rare gas, e.g. Ar, Kr, Xe or Rn, having a large mass or the mixture of Ar with Kr, Xe or Rn may be used as atmospheric gas. The high-pressure atmosphere suppress the evaporation of oxides of Group-V elements from the Si melt, so that the Si melt can be maintained at a high oxygen concentration under a stable condition until the start of pulling operation.
REFERENCES:
patent: 4591409 (1986-05-01), Ziem et al.
Huang Xin ming
Izunome Koji
Kimura Shigeyuki
Terashima Kazutaka
Breneman R. Bruce
Garrett Fehisa C.
Izunome Koji
Research Development Corporation of Japan
Terashima Kazutaka
LandOfFree
Preparation of silicon melt for use in pull method of manufactur does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Preparation of silicon melt for use in pull method of manufactur, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preparation of silicon melt for use in pull method of manufactur will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1362372