Preparation of silane, SiH.sub.4

Details Preparation of silane, SiH.sub.4 Preparation of silane, SiH.sub.4

1983-09-27

1985-02-12

Doll, John

Chemistry of inorganic compounds

Silicon or compound thereof

Binary compound

423DIG12, C01B 3304

Patent

active

044990634

ABSTRACT:
Essentially pure silane, SiH.sub.4, is facilely prepared in plural reactors, by (i) reacting chlorosilane with lithium hydride in a mixture of molten salts which comprises lithium chloride and potassium chloride, in a discrete first reaction zone, said mixture of molten salts being essentially eutectic in composition, the amount of chlorosilane being at least 5% less than that amount stoichiometrically required for reaction with the lithium hydride, and the amount of lithium hydride comprising at most 20 mole % of said mixture of molten salts, (ii) recovering product silane from said discrete first reaction zone, (iii) transferring said mixture of molten salts comprising unreacted lithium hydride dissolved therein from said discrete first reaction zone to a discrete second reaction zone, (iv) reacting chlorosilane with said unreacted lithium hydride dissolved in said mixture of molten salts in said discrete second reaction zone, the amount of chlorosilane being at least 2% in excess of that amount stoichiometrically required for reaction with said unreacted lithium hydride, and (v) recovering product silane from said discrete second reaction zone.

REFERENCES:
patent: 3078218 (1963-02-01), Sundermeyer
patent: 3163590 (1964-12-01), Litz et al.
patent: 4041136 (1977-08-01), Franklin et al.
patent: 4405591 (1983-09-01), Grosbois et al.

Affiliated with

Also associated with

Rating

Preparation of silane, SiH.sub.4 does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Preparation of silane, SiH.sub.4, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preparation of silane, SiH.sub.4 will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1388983