Preparation of resist image with methacrylate polymers

Details Preparation of resist image with methacrylate polymers Preparation of resist image with methacrylate polymers

1975-01-29

1977-03-08

Brammer, Jack P.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 351, 96115R, 204159, 204 14, 427 44, B05D 306, G03C 500

Patent

active

040113515

ABSTRACT:
A positive resist image is produced by exposure of a layer of non-crosslinked polymeric material to high energy radiation in a predetermined pattern, the polymeric material containing alkyl methacrylate units and polymerized units of certain other ethylenically unsaturated monomers, followed by removal of the electron degraded material from the exposed areas.

REFERENCES:
patent: 2905556 (1959-09-01), Fuchsman et al.
patent: 3535137 (1970-10-01), Haller et al.
patent: 3679497 (1972-07-01), Handy et al.
patent: 3770433 (1973-11-01), Bartelt et al.
patent: 3779806 (1973-12-01), Gipstein et al.
patent: 3898350 (1975-08-01), Gipstein et al.
Harris, Journal of Electro-Chemical Soc. vol. 120, No. 2, pp. 270-274.

Affiliated with

Also associated with

Rating

Preparation of resist image with methacrylate polymers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Preparation of resist image with methacrylate polymers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preparation of resist image with methacrylate polymers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1407089