Preparation of photomasks

Details Preparation of photomasks Preparation of photomasks

2006-10-03

2006-10-03

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S296000, C378S035000

Reexamination Certificate

active

07115342

ABSTRACT:
The present invention relates to the preparation of an x-ray photomask by exposing a free-standing film of a radiation sensitive metal/chalcogenide to an electron beam scanned in a defined pattern so as to generate areas in the film of reduced metal content in accordance with the defined pattern, as well as novel x-ray photomasks.

REFERENCES:
patent: 6033766 (2000-03-01), Block et al.
patent: 53029073 (1978-03-01), None
patent: 01283830 (1989-11-01), None
Willson, C.G., “Contrast Medium for X-Ray Mask Fabrication”IBM Technical Disclosure Bulletin22(7):2871 (Dec. 1979).

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