Preparation of partially cross-linked polymers and their use in

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

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525312, 525313, C08F26102

Patent

active

060720069

ABSTRACT:
This invention relates to a process for generating a organically soluble partially cross-linked acid labile polymer according to the present invention comprises the steps of providing a polymer with one or more monomer units, wherein at least one of the monomer units contain one or more pendant COOH or hydroxyl groups; and reacting said polymer with a polyvinyl ether in the presence of a acid catalyst to form links between at least two polymer chains. The resulting polymer can be used as a component in a photoresist formulation.

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Article entitled "Novel Deep UV Photoresist Based On Thermanl Cross-Linking and De-Crossing-Linking of Cross-Linkable Photoacid Generator" by Moon et al. as appeared in Journal of Photopolymer Science and Technology, vol. 11, No. 3 (1998), pp. 439-443.

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