Preparation of organic compounds using as a reactant an adduct o

Details Preparation of organic compounds using as a reactant an adduct o Preparation of organic compounds using as a reactant an adduct o

1991-09-25

1993-06-29

Higel, Floyd D.

Organic compounds -- part of the class 532-570 series

Organic compounds

Esters having the thiocarboxylate group, -cx-, wherein the...

560 24, 560330, 560336, 560346, 564 32, 564 61, 564 62, C01C 300, C01C 314, C01B 2112, C07C26502

Patent

active

052236358

ABSTRACT:
Process for the removal of isocyanic acid from a gaseous mixture of isocyanic acid and ammonia by introducing a tertiary amine or ether at 250.degree. to 600.degree. C. The gaseous reaction mixture is passed into an inert diluent and cooled, to condense an adduct of isocyanic acid and tertiary amine or ether, and the ammonia being removed as a gas.

REFERENCES:
patent: 3752880 (1973-08-01), Stamm et al.
patent: 3953427 (1976-04-01), Matolcsy et al.
patent: 4377530 (1983-03-01), Trenbeath et al.
patent: 4398036 (1983-08-01), McCoy et al.
patent: 5078980 (1992-01-01), Mullner et al.
patent: 5091553 (1992-02-01), Mullner et al.
Chemical Abstracts, vol. 82, 173135u, p. 129 (1975).
Chemical Abstracts, vol. 81, 172444m, p. 178 (1974).
Beilsteins Handbuch Der Organischen Chemie, 4th Edition, vol. 3, p. 33, (1921).
Beilsteins Handbuch Der Organischen Chemie, 4th Edition, vol. 4, p. 101, (1922).
Noller, Lehrbuch der Organischen Chemie, Springer-Verlag, (1960), p. 330.

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