Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...
Patent
1996-07-10
1998-08-04
Zemel, Irina S.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Mixing of two or more solid polymers; mixing of solid...
525268, 525269, 525312, 526172, C08F29104, C08F 410
Patent
active
057894876
ABSTRACT:
The present invention is directed to a process of atom (or group) transfer radical polymerization for the synthesis of novel homopolymer or a block or graft copolymer, optionally containing at least one polar group, with well defined molecular architecture and narrow polydispersity index, in the presence of an initiating system comprising (i) an initiator having a radically transferrable atom or group, (ii) a transition metal compound, and (iii) a ligand; the present invention is also directed to the synthesis of a macromolecule having at least two halogen groups which can be used as a macroinitiator component (i) to subsequently form a block or graft copolymer by an atom or group transfer radical polymerization process; the present invention is also directed to a process of atom or group transfer radical polymerization for the synthesis of a branched or hyperbranched polymer; in addition, the present invention is directed to a process of atom or group transfer radical polymerization for the synthesis of a macroinitiator which can subsequently be used to produce a block or graft copolymer.
REFERENCES:
M.Kato et al, Polymerization of Methyl Methacrylate with Carbon Tetrachloride/dichlorotris(triphenylphosphine)ruthenium(IIO/Methylaluminum Bis(2,6-di-tert-butylphrnoxide) initiating System. Macromolecules, 1995, 28, 1721-23.
E. Patten et al, "Polymers with Very Low Polydispersities from Atom Transfer Radical Polymerization", Science,272, May 1996, 864-68.
J-S.Wang et al "Controlled Sequential and Random Radical Copolymerization of Styrene and Butyl Acrylate", Polym. Prepr. (ACS) 36 (1), 1995, 465.
Coca Simion
Gaynor Scott G.
Jo Seong Mu
Matyjaszewski Krzysztof
Nakagawa Yoshiki
Carnegie-Mellon University
Zemel Irina S.
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