Preparation of microelectromechanical system device using an...

Details Preparation of microelectromechanical system device using an... Preparation of microelectromechanical system device using an...

2006-10-02

2008-10-28

Estrada, Michelle (Department: 2823)

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

C257SE21218, C257SE29324, C438S048000, C438S050000, C438S710000, C438S778000

Reexamination Certificate

active

07443001

ABSTRACT:
A method for preparing a microelectromechanical system (MEMS) device for subsequent processing is disclosed. The method includes establishing an anti-stiction material on exposed surfaces of the MEMS device. The exposed surfaces include at least an interior surface of a chamber and an external surface of the MEMS device. The anti-stiction material is selectively removed from at least a portion of the external surface via a plasma sputtering process under controlled conditions.

REFERENCES:
patent: 5573679 (1996-11-01), Mitchell et al.
patent: 6335224 (2002-01-01), Peterson et al.
patent: 6830950 (2004-12-01), Chinn et al.
patent: 6902947 (2005-06-01), Chinn et al.
patent: 7045170 (2006-05-01), Hankins et al.
patent: 7087456 (2006-08-01), Gory et al.
patent: 2001/0003676 (2001-06-01), Marks et al.
patent: 2004/0003828 (2004-01-01), Jackson
patent: 2005/0074919 (2005-04-01), Patel et al.
patent: 2005/0095833 (2005-05-01), Lutz et al.
patent: 2005/0109277 (2005-05-01), Kobrin et al.
patent: 2005/0214462 (2005-09-01), Kaeriyama et al.
patent: 2006/0076316 (2006-04-01), Bollinger et al.
patent: 2006/0096705 (2006-05-01), Shi et al.
patent: 2006/0205100 (2006-09-01), Huang et al.
patent: 2007/0026559 (2007-02-01), Haluzak et al.

Affiliated with

Also associated with

Rating

Preparation of microelectromechanical system device using an... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Preparation of microelectromechanical system device using an..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preparation of microelectromechanical system device using an... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4019282