Preparation of metal chalcogenide dispersions

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having growth from a solution comprising a solvent which is...

Reexamination Certificate

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C977S726000

Reexamination Certificate

active

06911081

ABSTRACT:
Optionally doped nanoparticle dispersions of metal chalcogenides are prepared by a precipitation step in aqueous medium, followed by a diafiltration or ultrafiltration step in the presence of a compound capable of preventing agglomeration of said metal chalcogenide nanoparticles.

REFERENCES:
patent: 5879715 (1999-03-01), Higgins et al.
patent: 6179912 (2001-01-01), Barbera-Guillem et al.
patent: 6241819 (2001-06-01), Bhargava et al.
patent: 0622439 (1994-02-01), None
patent: 0 622 439 (1994-11-01), None
patent: 00/46839 (2000-08-01), None
patent: WO 00/46839 (2000-10-01), None
European Search Report, Application No. 01 00 0010, Jun. 21, 2001.
Database Inspec 'Online!, Institute of Electrical Engineers, Stevenage, GB; Vacassy R et al.:“Nanostructured zinc sulfide phosphors” Database accession No. 6208568, XP002170204, Abstract.
Database Inspec 'Online!, Institute of Electrical Engineers, Stevenage, GB; Rogach A et al.:“Synthesis and characterization of a size series of extremely small thiol-stabilized CdSe noncrystals” Database accession No. 6302456, XP002170205.

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