Preparation of metal alkyls

Details Preparation of metal alkyls Preparation of metal alkyls

1988-10-31

1990-08-07

Davis, Curtis R.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

556 18, 556174, C07F 500, C07F 506

Patent

active

RE0332925

ABSTRACT:
A method of preparing a methyl alkyl of formula (R.sub.3 M).sub.x where R.sub.3 represents three alkyl groups R which may be the same or different, M represents a Group III metallic element and x is 1 or 2, which method comprises (a) forming a trialkyl adduct of formula (R.sub.3 M).sub.y. L wherein L represents an aryl-containing Group V, preferably phosphorus, donor ligand provided by an organic Lewis base which is stable at 20.degree. C., and wherein Y is an integer equal to the number of Group V atoms presents in the ligand, and (b) heating the adduct to provide thermal dissociation thereof thereby releasing the alkyl as a gaseous product.

REFERENCES:
patent: 2971017 (1961-02-01), Fischer et al.
patent: 3048612 (1962-08-01), Walde
patent: 3211707 (1965-10-01), Schulthess
patent: 3308143 (1967-03-01), Poe et al.
patent: 3310574 (1967-03-01), Todt et al.
patent: 3318931 (1967-05-01), Dotzer et al.
patent: 3367989 (1968-02-01), Scoggins et al.
patent: 3607257 (1971-09-01), Johnson
patent: 3657298 (1972-04-01), King et al.
patent: 4604473 (1986-08-01), Hamilton et al.
Durkin et al, Inorg. Chem., vol. 11(5), pp. 1054-1059 (1972).
Chemical Abstracts, 77, 74383p (1972).
Chemical Abstracts, 77, 19712v (1972).
Schmidbaur et al., "Alkylmetallkomplexe Von N-Silyl-Phosphiniminen", Chem. Ber., 100, 1000-1015 (1967) (Translation attached).

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