Stock material or miscellaneous articles – Composite – Of silicon containing
Patent
1988-12-02
1991-01-29
Cashion, Jr., Merrell C.
Stock material or miscellaneous articles
Composite
Of silicon containing
428448, 428450, 428457, 428900, 428901, B32B 1502, B32B 900
Patent
active
049885146
ABSTRACT:
A lower alkyl polysilsesquioxane having a general formula ##STR1## wherein R is CH.sub.3 is C.sub.2 H.sub.5, and n is an integer equal to about 50 to about 10,000, prepared by (a) dissolving a lower alkyl trifunctional silane in an organic solvent at a temperature of -31 20.degree. C. to -50.degree. C. to form an organic solution thereof; (b) hydrolyzing the lower alkyl trifunctional silane by dropping water into the organic solution at a temperature of -20.degree. C. to -50.degree. C. under an inert gas pressurized at 1,000 to 3,000 Pa; and (c) gradually heating the organic solution together with a water phase lying therebeneath up to a temperature of 60.degree. C. to 100.degree. C. under an inert gas pressurized at 1,000 to 3,000 Pa.
Also, a flat surfaced insulating layer of a silylated organopolysilsesquioxane having a general formula ##STR2## wherein R is an alkyl or phenyl group, and n is an integer equal to about 50 to about 2,000, preferably about 50 to about 500, formed on a circuit board having stepwise differences in height thereon, by applying an organic solution of the polymer; evaporating the solvent; and melting the polymer to flatten the surface of the polymer and curing the polymer.
REFERENCES:
patent: 3017386 (1962-01-01), Brown, Jr. et al.
patent: 4349609 (1982-09-01), Takeda et al.
patent: 4600685 (1986-07-01), Kitakohji et al.
patent: 4657843 (1987-04-01), Fukuyama et al.
patent: 4670299 (1987-06-01), Fukuyama et al.
patent: 4719125 (1988-01-01), Anello et al.
EP 85307905-European Search Report by Examiner Depijper at The Hague on Dec. 30, 1987.
Japanese Publication to Yogyo Kyokai Shi, vol. 92, No. 5, pp. 242 to 247, published May 1, 1984.
Fukuyama Shun-ichi
Matsuura Azuma
Miyagawa Masashi
Nishii Kota
Yoneda Yasuhiro
Cashion Jr. Merrell C.
Fujitsu Limited
Rucker Susan S.
LandOfFree
Preparation of lower alkyl polysilsesquioxane and formation of i does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Preparation of lower alkyl polysilsesquioxane and formation of i, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preparation of lower alkyl polysilsesquioxane and formation of i will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-812353