Preparation of largely HBr-free HCI gas and largely HBr-free...

Details Preparation of largely HBr-free HCI gas and largely HBr-free... Preparation of largely HBr-free HCI gas and largely HBr-free...

2005-05-10

2005-05-10

Nguyen, Ngoc-Yen (Department: 1754)

Chemistry of inorganic compounds

Halogen or compound thereof

Hydrogen halide

C423S24000R, C423S481000, C095S211000, C095S233000

Reexamination Certificate

active

06890508

ABSTRACT:
The present invention relates to a process for preparing largely HBr-free HCl gas and largely HBr-free aqueous HCl solution, which comprises the following steps:a) providing HBr-containing HCl gas;b) passing the HBr-containing HCl gas through aqueous HCl solution saturated with HCl;c) separating off HBr-containing aqueous HCl solution saturated with HCl;d) if desired, passing the largely HBr-free HCl gas obtained in step b) into water to obtain largely HBr-free aqueous HCl solution;with largely HBr-free aqueous HCl solution produced in step d) being able, if desired, to be recirculated to step b) of the process.The process of the present invention allows high-purity aqueous HCl solution for use in the semiconductor industry to be prepared inexpensively and on an industrial scale. However, the purified HCl gas obtained by means of steps a) to c) can also be used for any other purposes. The invention likewise provides an apparatus for carrying out the process of the present invention.

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Derwent Abst. 2001-344865/37.

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