Glass manufacturing – Processes – With shaping of particulate material and subsequent fusing...
Patent
1989-09-08
1990-12-25
Lacey, David L.
Glass manufacturing
Processes
With shaping of particulate material and subsequent fusing...
65900, 65901, 501 12, C03B 802
Patent
active
049799738
ABSTRACT:
The invention provides a method for the preparation of synthetic fused silica glass containing a very small amount of hydroxyl groups and has a high viscosity at high temperatures suitable for use as a material of articles for semiconductor processing at high temperatures, such as a crucible for Czochralski single crystal growing of semiconductor silicon. The method comprises hydrolyzing methyl silicate in a medium containing a specified amount of ammonia as a hydrolysis catalyst to form silica particles which are heat-treated in several successive steps.
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patent: 4500657 (1985-02-01), Kumar
patent: 4572729 (1986-02-01), Lang et al.
patent: 4747863 (1988-05-01), Claser et al.
patent: 4767433 (1988-08-01), Iura et al.
Shimizu Takaaki
Takita Masatoshi
Burns Todd J.
Lacey David L.
Shin-Etsu Chemical Co. , Ltd.
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