Preparation of fluorinated acetophenones

Details Preparation of fluorinated acetophenones Preparation of fluorinated acetophenones

2006-12-12

2006-12-12

Witherspoon, Sikarl A. (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Oxygen containing

C568S323000, C568S335000

Reexamination Certificate

active

07148384

ABSTRACT:
The invention relates to a process for preparing fluorinated acetophenones from fluorinated aryl compounds in the presence of N-hydroxyphthalimide and the use thereof.

REFERENCES:
patent: 4405824 (1983-09-01), Kobayashi et al.
patent: 5990357 (1999-11-01), Zawadiak et al.
patent: 6232258 (2001-05-01), Ishii et al.
patent: 6355634 (2002-03-01), Isenring et al.
patent: 6407100 (2002-06-01), Isenring et al.
Ishii, Yasutaka et al: “Alkane Oxidation with Molecular Oxygen Using a New Efficient Catalytic System: N-Hydroxyphthalimide (NHPI) Combined with Co(acac)n (n=2 or 3)” Journal of Organic Chemistry, 61(14), 4520-4526 Coden: Joceah; ISSN: 0022-3263, 1996, XP000591064 *Seite 4523, Spalte 1*.
Ishii, Yasutaka et al: Novel Catalysis by N-Hydroxyphthalimide in the Oxidation of Organic Substrates by Molecular Oxygen Journal of Organic Chemistry, 60(13), 3934-5 Coden: Joceah; ISSN: 0022-3263, 1995, XP000512054 *Tabelle 1*.
Ishii, Yasutaka et al: “A new strategy for alkane oxidation with O2usingN-hydroxyphthalimide (NHPI) as a radical catalyst” Catalysis Surveys from Japan (1999) 3, pp. 37-35.
Ishii, Yasutaka et al “Innovation of Hydrocarbon Oxidation with Molecular Oxygen and Related Reactions” Adv. Synth. Catal. 2001, 343, No. 5, pp. 393-427.

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