Preparation of essentially alkali-free borosilicate crystals hav

Details Preparation of essentially alkali-free borosilicate crystals hav Preparation of essentially alkali-free borosilicate crystals hav

1993-12-23

1995-04-25

McFarlane, Anthony

Chemistry of inorganic compounds

Boron or compound thereof

Oxygen containing

423325, 423704, 502 64, 502202, C01B 3320

Patent

active

054096820

ABSTRACT:
Essentially alkali-free borosilicate crystals having a zeolite structure and a size of from 2 to 150 .mu.m, measured over the longitudinal crystallite axis, are prepared by a process in which an SiO.sub.2 -containing mixture of water, a tetraalkylammonium compound, a boron component and ammonia is reacted hydrothermally in the absence of a metal hydroxide or of a metal salt in a molar ratio of ammonia/tetraalkylammonium of from 3:1 to 150:1.

REFERENCES:
patent: 4269813 (1981-05-01), Klotz
patent: 4285919 (1981-08-01), Klotz et al.
patent: 4331641 (1982-05-01), Hinnenkamp et al.
patent: 4401637 (1983-08-01), Marosi et al.
patent: 4456582 (1984-06-01), Marosi et al.
patent: 4462971 (1984-07-01), Hinnenkamp et al.
patent: 4514516 (1985-04-01), Puskas
patent: 4554142 (1985-11-01), Hoelderich et al.
patent: 4656016 (1987-04-01), Taramasso et al.
patent: 4721607 (1988-01-01), Haddad et al.
patent: 5110570 (1992-05-01), Bellussi et al.
patent: 5296208 (1994-03-01), Lesch
J. C. Jansen, E. Biron and H. van Bekkum, Innovation in Zeolite Materials (1988) pp. 133-141.
Database WPIL, Week 9110, Derwent Publ. Ltd., London, GB; AN 91-071605, 1991.

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