Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2005-04-15
2009-10-13
Barr, Michael (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
C419S045000, C419S048000, C419S051000, C419S052000, C427S458000, C427S591000
Reexamination Certificate
active
07601403
ABSTRACT:
A method for preparing highly dense functional oxides with crystallite size in the range of 10-20 nm. Using a high pressure modification of a the Spark Plasma Sintering (SPS) technique, rapid thermal cycles (<10 min) coupled with very rapid pressure increase up to 1 GPa can be obtained allowing high degree of compaction and very limited grain growth. This combination of techniques was employed to produce the finest-grained ceramics ever prepared in bulk form in the case of fully stabilized zirconia and Sm-doped Ceria.
REFERENCES:
patent: 5794113 (1998-08-01), Munir et al.
patent: 6261420 (2001-07-01), Kubota et al.
Kim et al., Effect of initial particle size on microstructure of liquid-phase sintered alpha-silicon carbide, 2000, Journal of European Cermic Society, vol. 20, pp. 945-949.
Anselmi-Tamburini Umberto
Garay Javier E.
Munir Zuhair A.
Barr Michael
Bowman Andrew
The Regents of the University of California
Townsend and Townsend / and Crew LLP
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