Preparation of colloidal dispersions of ruthenium, rhodium, osmi

Compositions – Preservative agents – Anti-oxidants or chemical change inhibitants

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

260 4222, 430286, 430945, 568451, 568454, 568455, B01J 3102, C08K 308

Patent

active

042526787

ABSTRACT:
There is disclosed a method for the preparation of a homogeneous, physically stable dispersion of colloidal metal particles of a transition metal selected from the group consisting of ruthenium, rhodium, osmium and iridium, having a size in the range of from about 10 Angstrom units to about 200 Angstrom units. The method comprises preparing a solution of a functional polymer in an inert solvent, and incrementally adding thereto a transition metal cluster compound at a temperature at which the transition metal cluster compound will become bound to the polymer and thermally decompose to produce elemental transition metal particles, the process being carried out in an inert atmosphere. Such dispersions may be used per se as catalysts, or may be used for the preparation of supported colloidal transition metal catalysts. The dispersions may also be used for the preparation of ablative optical recording media.

REFERENCES:
patent: 3228881 (1966-01-01), Thomas
patent: 3281344 (1966-10-01), Thomas
patent: 3998864 (1976-12-01), Trevillyan
patent: 3998887 (1976-12-01), Allen

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Preparation of colloidal dispersions of ruthenium, rhodium, osmi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Preparation of colloidal dispersions of ruthenium, rhodium, osmi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preparation of colloidal dispersions of ruthenium, rhodium, osmi will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1408367

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.