Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Reexamination Certificate
2007-10-02
2007-10-02
Hiteshew, Felisa (Department: 1722)
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
C117S070000, C117S081000, C117S083000
Reexamination Certificate
active
10981889
ABSTRACT:
The present invention is directed to a method of making large diameter metal fluoride sungle crystals that can be used in optical lithograpby systems, for example, excimer laser that operate below 200 nm. In addition, the invention is directed to metal fluoride single crystals suitable for use in such lithographic ststems, such fluoride crystals having a internal transmission of ≧99.9% at 193 nm and ≧99.0% at 157 nm.
REFERENCES:
patent: 6669778 (2003-12-01), Meyer-Fredholm
patent: 6782075 (2004-08-01), Pell
patent: 6894284 (2005-05-01), Mayolet et al.
Meyer-Fredholm Michele M. L.
Pell Michael A.
Corning Incorporated
Douglas Walter M.
Hiteshew Felisa
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