Preparation method of exposure original plate

Details Preparation method of exposure original plate Preparation method of exposure original plate

2005-09-27

2005-09-27

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S296000, C430S942000

Reexamination Certificate

active

06949320

ABSTRACT:
The preparation method of an exposure original plate according to the present invention includes a step of subdividing a pattern constituting an exposure original plate into a plurality of rectangular patterns, a step of extracting micro patterns having the size of a side smaller than a prescribed value from among the divided individual rectangular patterns, a step of forming a corrected micro pattern by increasing the size of the side of the extracted micro pattern perpendicular to the side making contact with an adjacent patter at least by the prescribed value, a step of forming a corrected adjacent pattern by retreating the side of the adjacent pattern making contact with the corrected micro pattern by the increased amount corresponding to the prescribed value, and a step of finding EB exposure data for the pattern including the corrected micro pattern and the corrected adjacent pattern, and carrying out EB exposure by the variable shaped beam exposure method based on the EB exposure data.

REFERENCES:
patent: 9-129531 (1997-05-01), None
patent: 2000-323389 (2000-11-01), None

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