Predoped transfer gate for a CMOS image sensor

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

Reexamination Certificate

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Details

C438S073000, C438S286000, C438S525000, C257SE31073

Reexamination Certificate

active

07888156

ABSTRACT:
A novel CMOS image sensor Active Pixel Sensor (APS) cell structure and method of manufacture. Particularly, a CMOS image sensor APS cell having a predoped transfer gate is formed that avoids the variations of Vtas a result of subsequent manufacturing steps. According to the preferred embodiment of the invention, the CMOS image sensor APS cell structure includes a doped p-type pinning layer and an n-type doped gate. There is additionally provided a method of forming the CMOS image sensor APS cell having a predoped transfer gate and a doped pinning layer. The predoped transfer gate prevents part of the gate from becoming p-type doped.

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