Prediction method and apparatus for substrate processing...

Details Prediction method and apparatus for substrate processing... Prediction method and apparatus for substrate processing...

2007-03-09

2009-12-08

Garber, Charles D. (Department: 2812)

Optics: measuring and testing

With plural diverse test or art

C438S017000

Reexamination Certificate

active

07630064

ABSTRACT:
A prediction method for a substrate processing apparatus is to predict processing results from operation data on the substrate processing apparatus during a procedure for processing a target processing substrate in a processing chamber of the substrate processing apparatus. The method includes the steps of: collecting operation data obtained; and obtaining a moving average of a preset number of sets of data using the processing result data collected at the data collection step. The method further includes the steps of: performing multivariate analysis using the operation data collected at the data collection step and the moving average processing result data obtained at the moving average processing step; and predicting processing results using operation data obtained when a target processing substrate, other than the target processing substrate used to obtain the correlation at the analysis step, is processed on a basis of the correlation.

REFERENCES:
patent: 6985215 (2006-01-01), Oh et al.
patent: 7263463 (2007-08-01), Yamazaki
patent: 2005/0071037 (2005-03-01), Strang
patent: 2005/0146709 (2005-07-01), Oh et al.
patent: 2003-23001 (2003-01-01), None

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