Precursors for chemical vapor deposition

Coating processes – Coating by vapor – gas – or smoke

Reexamination Certificate

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C427S255360, C556S051000

Reexamination Certificate

active

07419698

ABSTRACT:
Ti, Zr Hf and La precursors for use in MOCVD techniques have a ligand of the general formula OCR1(R2)CH2X, wherein R1is H or an alkyl group, R2is an optionally substituted alkyl group and X is selected from OR and NR2, wherein R is an alkyl group or a substituted alkyl group.

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