Precision thickness optical coating system and method of operati

Details Precision thickness optical coating system and method of operati Precision thickness optical coating system and method of operati

1998-04-20

2000-03-21

Tentoni, Leo B.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Condition of coated material

118 501, 118678, 118712, 118723EB, 118730, 20429803, 20429828, 356382, 356435, C23C 1430, C23C 1434, C23C 1648, C23C 1652

Patent

active

06039806&

ABSTRACT:
The present invention provides for a system for the precision optical coating of substrates and a method of operating the system. The system has a vacuum chamber, a plasma source in the vacuum chamber, a plurality of e-beam evaporation units which generate a vapor of optical coating material in the vacuum chamber, and a plurality of stations, each station holding one substrate and rotating the substrate during deposition of the optical coating material upon the substrate. Each of the stations has an optical monitoring unit which monitors in situ the deposition of the optical coating material upon the corresponding substrate. With the described system, high production rates of precision optical elements, such as narrow bandpass optical filters, can be achieved.

REFERENCES:
patent: 3892490 (1975-07-01), Uetsuki et al.
patent: 4140078 (1979-02-01), Wilmanns
patent: 4311725 (1982-01-01), Holland
patent: 5359683 (1994-10-01), Pan

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