Precision replication by chemical vapor deposition

Plastic and nonmetallic article shaping or treating: processes – With step of cleaning – polishing – or preconditioning...

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264 121, 264 401, 264 81, 249115, C23C 1600

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active

060427582

ABSTRACT:
Articles having at least one precision replicated surface are formed by chemical vapor deposition on a substrate surface which has been precision shaped and finished as the converse of the desired precision surface of the article. The substrate surface is provided with a thin release coating which adheres to the substrate when the article is removed thereby allowing the substrate to be reused. The method is particularly advantageous for forming the interior surfaces of domes and asymmetrical optical surfaces of zinc sulfide.

REFERENCES:
patent: 4332751 (1982-06-01), Brassell et al.
patent: 4963393 (1990-10-01), Goela et al.
patent: 4978577 (1990-12-01), Purohit et al.
patent: 4990374 (1991-02-01), Keeley et al.
patent: 4997678 (1991-03-01), Taylor et al.
patent: 5071596 (1991-12-01), Goela et al.
patent: 5175929 (1993-01-01), Anthony et al.
patent: 5314652 (1994-05-01), Simpson et al.
patent: 5453233 (1995-09-01), Teverovsky et al.
patent: 5686195 (1997-11-01), Taylor et al.
Goela, et al., "CVD Replication for Optics Applications" SPIE Proc., 1047, pp. 198-210 (1989).
U.S. application No. 09/072,927, filed May 5, 1998 (no copy enclosed).

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