Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Patent
1995-06-05
1997-05-27
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
430 9, 430258, 430257, 430314, G03C 300
Patent
active
056331053
ABSTRACT:
A conformal mask permits the manufacture of precision frequency selective surfaces (FSS) that have patterns on complexly curved surfaces. These FSSs are used in precision radomes. The mask has a transparent substrate and a patterned opaque layer on the substrate. The layer may be patterned by laser ablation. Alternatively, the patterning of the opaque layer can be accomplished by applying a layer of photosensitive material over the opaque layer and then defining temporary and permanent areas thereof. The temporary areas of the photosensitive layer and the opaque layer are removed sequentially to define the transparent portions of the mask. Parts are made by intimately mating the mask and a part body to which a layer of metal and a layer of photosensitive material have been applied, and exposing the part to radiation through the mask. The exposed part is then chemically developed, the layer of metal is etched, and the remainder of the layer of photosensitive material is removed to complete the patterning of the part body surface. The mask is preferably made using a high precision laser etch system to sharply define the transparent portions of the mask and maximize the precision of the patterning on the subsequently made parts.
REFERENCES:
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Brochure entitled: "Laserdyne Models 780 and 780 BeamDirector," Laserdyne Products, Lumonics Laser Systems Group, Eden Prairie, MN, 1990.
Brochure entitled: "Florod Laser Systems for Microelectronics," Florod Corp., Gardena, CA, 1988.
Brochure entitled: "UFE Molded Circuit Technology," UFE, Inc., Stillwater, New Products, Feb. 1991, pp. 7 & 8 MN (undated).
Brochure entitled: "Model LFA-308 Excimer Laser Cutter," Florod Corp., Gardena, CA, 1991.
Jensen David G.
Tichenor Daniel R.
Hammar John C.
Rosasco S.
The Boeing Company
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