Optical: systems and elements – Optical aperture or tube – or transparent closure
Patent
1993-07-12
1995-01-24
LaRoche, Eugene R.
Optical: systems and elements
Optical aperture or tube, or transparent closure
359227, 359230, 359231, 359232, 359233, G01J 304
Patent
active
053846621
ABSTRACT:
This invention relates generally to slits used in optics that must be precisely aligned and adjusted. The optical slits of the present invention are useful in x-ray optics, x-ray beam lines, optical systems in which the entrance slit is critical for high wavelength resolution. The invention is particularly useful in ultra high vacuum systems where lubricants are difficult to use and designs which avoid the movement of metal parts against one another are important, such as monochrometers for high wavelength resolution with ultra high vacuum systems. The invention further relates to optical systems in which temperature characteristics of the slit materials is important. The present invention yet additionally relates to precision slits wherein the opposing edges of the slit must be precisely moved relative to a center line between the edges with each edge retaining its parallel orientation with respect to the other edge and/or the center line.
REFERENCES:
patent: 2705440 (1955-04-01), George et al.
patent: 4017162 (1977-04-01), Mills
Andresen Nord C.
DiGennaro Richard S.
Swain Thomas L.
LaRoche Eugene R.
Niranjan F.
Ross Pepi
The Regents of the University of California
LandOfFree
Precision optical slit for high heat load or ultra high vacuum does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Precision optical slit for high heat load or ultra high vacuum, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Precision optical slit for high heat load or ultra high vacuum will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1471655