Precision IC alignment keys and method

Details Precision IC alignment keys and method Precision IC alignment keys and method

1982-08-11

1985-06-18

Rosenberger, R. A.

Optics: measuring and testing

By alignment in lateral direction

G01B 1100

Patent

active

045238510

ABSTRACT:
Various structural patterns of alignment keys particularly suited for aligning masks and wafers during the fabrication of semiconductor devices. Each alignment key includes an orthogonal arrangement of bar-shaped segments. The relative dimensions of the mask and wafer alignment keys ensure a partial overlap and coaxial positioning of the bar-shaped segments when the keys are fully aligned. Precise optical alignment of the mask and wafer keys is evidenced by visually perceived edge diffraction effects. The invention also encompasses a systematic method for aligning representative structural patterns.

REFERENCES:
patent: 3694089 (1972-09-01), Rantsch
patent: 3739247 (1973-06-01), Yamaguchi et al.
patent: 3918813 (1975-11-01), Rossiter
patent: 3947126 (1976-03-01), Mendez
patent: 4167677 (1979-09-01), Suzki

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