Cleaning and liquid contact with solids – Apparatus – Automatic controls
Patent
1995-03-03
1998-01-13
Stinson, Frankie L.
Cleaning and liquid contact with solids
Apparatus
Automatic controls
134 58R, 134113, 1341042, B08B 302
Patent
active
057068402
ABSTRACT:
A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.
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U.S. application No. 08/108,935, Wessendorf, filed Aug. 18, 1993.
Frye Gregory C.
Martin Stephen J.
Schneider Thomas W.
Hohimer John P.
Sandia Corporation
Stinson Frankie L.
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