Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1986-02-14
1988-06-07
Tung, T.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
204130, 204248, 204249, 204275, 204284, 204290R, 204292, 204302, C02F 146
Patent
active
047494573
ABSTRACT:
A method of precipitating colloidal materials from aqueous systems and a dynamic bimetallic galvanic cell is disclosed, said cell including a metallic electrode which provides a source of flocculating agent and an inert electrode to which the metallic electrode is short circuited. When water containing colloidal particles is passed through the galvanic cell and the electrodes are short circuited, the metallic electrode provides a source of flocculating agent which coprecipitates with the colloidal particles, forming a sediment which can be readily removed. The cell is constructed to maximize the contact between the water and the electrode surfaces and to maintain the metallic electrode short circuited against the inert electrode as the metallic electrode is consumed.
REFERENCES:
patent: 1222637 (1917-04-01), Landreth
patent: 2724688 (1955-11-01), Gruner
patent: 3256504 (1966-06-01), Fidelman
patent: 3392102 (1968-07-01), Koch
patent: 3425925 (1969-02-01), Fleischman
patent: 3474014 (1969-10-01), Aul
patent: 3928155 (1975-12-01), Woodhouse
patent: 4152229 (1979-05-01), Soltys et al.
Friberg Stig E.
Yasuda Hirotsugu
Fishel Grace J.
The Curators of the University of Missouri
Tung T.
LandOfFree
Precipitation of colloidal materials from aqueous systems by ele does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Precipitation of colloidal materials from aqueous systems by ele, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Precipitation of colloidal materials from aqueous systems by ele will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-843119